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electronic publishingENGINEERING BULLETINPublisher: All-Russian public organization "Academy of Engineering Sciences named after A.M. Prokhorov".
77-48211/368736 Research of double exposure mask technology’s critical parameters
Engineering Bulletin # 05, May 2012
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Аверьянихин_P.pdf
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References 1. Nemudrov V., Martin G. Sistemy-na-kristalle. Proektirovanie i razvitie [System-on-chip. Design and development]. Moscow, Tekhnosfera, 2004. 212 p. 2. Moore G. Cramming More Components Onto Integrated Circuits. Electronics, 1965, vol. 38, no. 8, pp. 114- 117. 3. Suzuki K., Smith B.W. Microlithography: Science and technology. CRC Press, 2007, 800 p. 4. Zinchenko L. A., Rezchikova E.V., Aver'ianikhin A.E. Algoritmy transformatsii topologii submikronnykh SBIS [Algorithms of Topology Transformation of Submicron Very Large-Scale Integration Circuits]. Vestnik MGTU im. N.E. Baumana. Ser. Priborostroenie [Herald of the Bauman MSTU. Ser. Instrumentation], 2011, no. 1, pp. 76-78 . 5. Kureichik V.M., Zinchenko L.A., Tarasenko M.V. Primenenie simvol'nykh informatsionnykh tekhnologii v zadachakh modelirovaniia elektronnykh ustroistv[The use of symbolic information technologies in problems of modeling of electronic devices]. Programmnye produkty i sistemy, 2001, no. 2, pp. 13-17. 6. Geller D., Stahl S. The chromatic number and other parameters of the lexicographic product. J. Combin. Theory Ser. B 19, August 1975, vol. 19, no. 1, pp. 87–95. doi:10.1016/0095-8956(75)90076-3 7. Vlasov A.I., Nazarov A.V. Osnovy modelirovaniia mikro- i nanosistem [The bases of modelling of micro - and nanosystems]. Moscow, Bauman MSTU Publ., 2011. 144 p. (Biblioteka "Nanoinzheneriia": v 17 kn. Kn. 14 [Library "Nanoengineering". In 17 books. Book 14]). 8. Vlasov A.I., Zinchenko L.A., Makarchuk V.V., Rodionov I.A. Avtomatizirovannoe proektirovanie nanosistem [Computer-aided design of nanosystems]. Moscow, Bauman MSTU Publ., 2011. 184 p. (Biblioteka "Nanoinzheneriia": v 17 kn. Kn. 13 [Library Nanoengineering". In 17 books. Book 13]). 9. Makarchuk V.V., Rodionov I.A., Tsvetkov Iu.B. Metody litografii v nanoinzhenerii [Methods of lithography in nanoengineering]. Moscow, Bauman MSTU Publ., 2011. 175 p. (Biblioteka "Nanoinzheneriia": v 17 kn. Kn. 9 [Library Nanoengineering". In 17 books. Book 9]). 10. Zinchenko L.A. SAPR Nanosistem [CAD Nanosystems]. Moscow, Bauman MSTU Publ., 2011. 224 p. (Biblioteka "Nanoinzheneriia": v 17 kn. Kn. 17 [Library Nanoengineering". In 17 books. Book 17]). Publications with keywords: VLSI, exposure mask, contradiction graph Publications with words: VLSI, exposure mask, contradiction graph See also: Thematic rubrics: Поделиться:
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